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首页-Home 无机-Inorganic Chem Sputtering Targets Titanium Aluminum Sputtering Target

Titanium Aluminum Sputtering Target

6
钛铝合金靶
Titanium Aluminum Sputtering Target
Ti-Al；50:50at% 80:20at% 70:30at%
Φ98*45; Φ80*50; Φ100*40mm; 70*7; 80*8; 127*10
4.51
PVD vacuum coating
Sputtering Targets金属-Non-Ferrous Metals
  • 产品详情-Products Details

Titanium aluminum alloy target

Form : Round, Multi-arc

Process: smelting; HIP

Proportion: 50:50at%, 80:20at%, 70:30at%, etc.

Purpose: used for vacuum ion plating. Different gases can be added, different colors can be plated and beautiful.



上一个：Rotating Titanium Sputtering Target 下一个：Zirconium Sputtering Target

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