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首页-Home 无机-Inorganic Chem Sputtering Targets SiO2 Sputtering Targets

SiO2 Sputtering Targets

二氧化硅靶材

3
二氧化硅靶材
SiO2 Sputtering Targets
SiO2; 4N
Φ255.6×12.7mm or customized
2.4g/cm3
Melting point: 1670℃
For optical coating, vacuum coating, sputtering target material, magnetic film, electronic material, alloy material, etc.
无机-Inorganic ChemSputtering Targets
  • 产品详情-Products Details

  • Molecular Formula.：SiO2

  • Molecular Weight.：60.08

  • CAS No.：14808-60-7

  • EINECS.：215-684-8


上一个：Silicon Rotary Sputtering Target 下一个：ZnSe Windows

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