Silicon Rotary Sputtering Target
硅旋转靶
30- 硅旋转靶
- Silicon Rotary Sputtering Target
- Silicon; 3N, 4N
- Outer diameter < 360mm, Internal diameter > 1mm, Wall thickness > 1mm, Length 1-4000mm
- 2.32-2.34
- 3.42 @ 4.58μm
- Optical Coating, Magnetron Sputtering Coating
无机-Inorganic ChemSputtering Targets
- 产品详情-Products Details
Form : Tubular
Rotating Silicon Target
Main ingredients: Si + stainless steel;
Application: optical coating and magnetron sputtering coating.
Plasma thermal spraying is to use plasma to heat powdered or filamentous metal and non-metallic materials to molten or semi molten state, and then spray them to the pretreated substrate surface with the help of compressed air at high speed to deposit and form a target with a certain thickness.
