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首页-Home 无机-Inorganic Chem Sputtering Targets Titanium Sputtering Target

Titanium Sputtering Target

7
钛靶
Titanium Sputtering Target
Titanium
Dia:60-100mm; Thickness: 20-50mm or according to the customer's requirements
4.506g
2.160
PVD, Sputtering Deposition
Sputtering Targets金属-Non-Ferrous Metals
  • 产品详情-Products Details

Titanium Sputtering Target

Form : Round, Tube, Rectangle

Standard: ASTM b348, ASTM b381, ams4928

Grade : TA1，TA2

Weight : 0.2-10 (kg/piece)

Process: Forging

Application: CVD evaporation material, sputtering target


上一个：Boron Carbide Target 下一个：Tantalum Sputtering Target

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