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首页-Home 无机-Inorganic Chem Sputtering Targets ITO (High density) Tablets

ITO (High density) Tablets

1
ITO (氧化铟锡)压片
ITO (High density) Tablets
In2O3+SnO2；4N
10*3; 18*8; 24*14; 30*10mm or according to the customer's requirements
Relative density: ≥ 99.5%
Resistivity ≤1.6X10-4 Ω·cm
ITO conductive film, LCD, LED, etc
Sputtering Targets
  • 产品详情-Products Details

Form : Black Tablets

Production process of ITO target

1. Hot isostatic pressing method

2. Hot pressing method

3. Sintering method

 

ITO target is sputtered onto coated glass or other substrates by magnetron sputtering to form ITO film.

Multi-assemblies bonded to copper backing plate is option.



上一个：ITO Rotating Sputtering Target 下一个：ITO Target

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