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首页-Home 无机-Inorganic Chem Sputtering Targets ITO Rotating Sputtering Target

ITO Rotating Sputtering Target

7
ITO(氧化铟锡)旋转靶
ITO Rotating Sputtering Target
In2O3+SnO2；4N
ID:133-138mm; OD: 151-169mm; L: 150-260mm or according to the customer's
Relative density: ≥ 99.5%
Resistivity ≤1.6X10-4 Ω·cm
ITO conductive film, LCD, LED, etc
Sputtering TargetsCeramic Materials
  • 产品详情-Products Details

Form : Black tube

Production process of ITO target

1. Hot isostatic pressing method

2. Hot pressing method

3. Sintering method

 

ITO target is sputtered onto coated glass or other substrates by magnetron sputtering to form ITO film.

Multi-assemblies bonded to copper backing plate is option.



上一个：TiOx Target 下一个：ITO (High density) Tablets

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